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Photomask Equipment by SUSS

SUSS suite of Wafer / Reticule cleaning and Photomask fabrication equipment features both wafer and mask cleaning systems with semi and fully automatic processing capabilities.

Fully automated mask fabrication equipment including bake, clean and develop, from standard through to EUVL and NIL requirements.

SÜSS Microtec

Further Information

Contact Us

Tel: +44 (0)1264 334505

Email: enquiries@inseto.co.uk

What is a Semiconductor Photomask?

A semiconductor photomask is a critical component in the photolithography process used to manufacture integrated circuits (ICs) and other microelectronic devices

Photomasks (sometimes called a mask or reticle) are flat, transparent plates, usually made of quartz or glass that mirror the circuit pattern for one layer of a microchip.

During photolithography, light passes through the transparent regions of the photomask and is blocked by the opaque areas, transferring the circuit design onto a photoresist-coated substrate.

Key aspects of a photomask:

  • Photomasks act as a stencil, defining where material will be etched or deposited on the wafer.
  • Multi-Layer Process: Modern chips require multiple layers, so a complete device may need 5 to 40+ individual photomasks, known as a mask set.
  • Cleanliness: Even microscopic errors in a photomask can lead to defective chips, making cleanliness essential.

Inseto Knowledge Base Document:

Read our guide to the “Semiconductor Photolithography Basics

Wiki – Semiconductor Device Fabrication

Semiconductor Device Fabrication overview – Wikipedia

Applications

UV Lithography, Wafer Resist Coating with Spin, Spray or Puddle Dispense, Resist Developing, Wafer Cleaning, Metal Layer Lift Off, Baking, Wafer Prime etc.

Industry Segments

Wafer level chip-scale packaging, flip chip packaging, bumping, MEMS, LED, power devices, optical components and compound substrates and other semiconductor related device R&D applications

Region

United Kingdom, Ireland, Sweden, Finland, Norway & Iceland

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