Benchtop Plasma Cleaning System: PE-50

The PE-50 Benchtop Plasma Cleaning System is a compact yet powerful solution for precision surface treatment in research and production environments.

Designed for ease of use and consistent performance, this system delivers effective plasma cleaning and plasma etching that improve adhesion, remove organic contaminants, and prepare substrates for advanced bonding processes.

Its small footprint and versatile capabilities make the PE-50 ideal for laboratories and facilities requiring reliable, high-quality surface preparation.

The system offers many features not found in competitive units, including: automatic program sequencing, recipe storage, 200W 20-80KHz auto frequency tuning RF power supply and an aluminium process chamber etc.

The PE-50 utilises a capacitive parallel plate design for the most effective plasma generation and is suitable for processing up to 100x150mm samples (larger & smaller systems are also available). In addition, an optional 13.56MHz source enables high speed processing or isotropic etching, using O2 or CF4 type gases etc.

PE-50 features include:

• Durable Welded Aluminium Vacuum Chamber
• Chamber Dimensions: 140Wx180Dx90Hmm (5.5″x7″x3.5″)
• Single 115Wx150Dmm (4.5″x6″) RF Powered Electrode
• 200W 20-80KHz Auto Frequency Tuning With Adjustable Pulsing Rate
• 2 Rotometer Gas Control 0-25cc/min
• Pirani Vacuum Gauge, 0-1Torr
• PLC Microprocessor Control System
• Keypad user interface with alphanumeric display
• Storage of one Process Recipe
• Automatic Process Sequencing
• 5 CFM Oxygen Service Vacuum Pump
• Console Dimensions: 350Wx365Dx450Hmm (14x14x18″)
• Approximate Shipping weight is 40Kg
• Electrical: 230/240VAC, 14A

Options:

• Dry Vacuum Pump
• 150W, 13.56MHz Generator & Automatic Matching Network
• Light Status Traffic Light Bar
• Mass Flow Meter