PEO-604 Semiconductor Furnace

ATV’s PEO-604 is a quartz tube semiconductor wafer furnace for oxidation and annealing, processes etc.

The system accommodates wafers up to 200mm in diameter, with a flat zone within the furnace for up to 50 wafers (temperature uniformity +/- 1.5°C, over 150mm batch). Furnace body is hermetically sealed providing < 1 ppm Oxygen contact with 2 x vacuum N2 back fill routines. Windows based process recipe generation and management system: 100steps per recipe, Step length 1s – 99:59min, process data logging, several user levels, Barcode management and a PLC Controller.

Designed for volume production through wall installation is possible while still retaining easy to access service hatches for preventative and routine maintenance. The PEO 604 has low energy and gas consumption with zero energy loss at Ambient Standby.

The systems are high quality, reliable production tools capable of continuous operation and rapid switching between a variety of complex processes without contamination using the novel “in-liner” principle.

PEO-604 in-liner principle for wet/dry thermal oxidation and annealing with gas inlet through door bell jar ball joint into In Liner – by this method, a clean atmosphere is maintained inside it, scarifying the original process tube

• Run multiple processes in the same furnace
• Prevents cross contamination across different processes
• Prevents deposition outside in-liner
• In-liners are replaceable without leak-check
• Flexible with wafer boats
• Easy to replace

Thermal oxidation of silicon

• Wet oxidation using H2O bubbler for various applications e.g. MEMS
• Thick oxides e.g. 3 μm SiO2 (30h at 1100°C)
• Automatic water refill setup