Plasma Cleaner and Etching Equipment
Inseto supplies a comprehensive range of plasma cleaner and etching systems from Plasma Etch Inc., designed to meet the needs of research, development, and production environments. The systems are ideal for surface preparation, contaminant removal, and material modification.
Plasma cleaning and plasma etching are widely used in industries such as electronics, medical devices, ophthalmic, automotive, semiconductor manufacturing and research.
Plasma Cleaners for Research to Production
Plasma Etch, Inc. founded in 1980 are leading manufacturers of Plasma cleaner and etching equipment, including bench-top models through industrial to high volume production equipment. They also a range of produce polymerization systems and atmospheric plasma equipment. Plasma Etch systems set the standard for reliability, speed and uniformity in plasma processing.
With multiple patents, Plasma Etch cleaning and etching systems have enhanced manufacturing and research processes worldwide. These patented features have been a unique asset to the Company’s product line and are exclusively available to Plasma Etch customers.
Plasma Cleaning and Etching – What’s the Difference?
Both techniques offer dry, environmentally friendly alternatives to traditional chemical treatments, delivering high precision and reliability across research and production environments.
Plasma cleaning is primarily employed to remove organic and inorganic contaminants from surfaces, enhance adhesion, and improve wettability. This makes it ideal for applications like wire bonding, coating preparation, and surface activation.
Plasma etching is a subtractive process used to precisely remove material from surfaces. This makes it ideal for use in semiconductor applications, such as photoresist stripping (ashing), surface cleaning, and etching of dielectric layers like SiO₂, without damaging underlying structures.
Learn More About “Low Pressure Plasma Cleaning”
For an introduction to the low pressure plasma process, please see our “Knowledge Base Document” here.
Technical Advice on Plasma Cleaning & Etching Equipment
Need help advice on choosing the right low pressure or atmospheric plasma equipment? Have questions about the plasma process? Our team of technical specialists are here to help you, please get in touch: enquiries@inseto.co.uk or call: +44 1264 334505.
Bench-top Plasma Cleaning Equipment
A full range of bench-top plasma cleaning and etching equipment, from compact low-cost models to large plasma cleaning and etching systems.
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Industrial Plasma Cleaning Equipment
A range of high-quality plasma cleaning and etching equipment with increased chamber sizes and capabilities.
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Atmospheric Plasma Treatment Equipment
A range of Atmospheric Plasma Treatment Equipment suitable for cleaning and surface preparation/pre-treatment.
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Further Information
What is a Plasma Cleaner?
A plasma cleaner is a machine designed to remove organic contaminants and modify surface properties at the molecular level. The cleaner uses energized gas (plasma) to break down hydrocarbons and other residues. This leaves surfaces very clean and ready for bonding, coating, or further processing.
Plasma cleaning is widely used across the semiconductor, medical, aerospace and research industries. It is ideal for applications such as hydrophilic surface modification, oxide removal, and surface preparation for improved adhesion. The process is dry, environmentally friendly, and highly effective.
How is the Plasma Generated?
Plasma cleaners create plasma by using high-frequency electrical energy. This energy is applied to a process gas in a vacuum or atmospheric chamber. This energy excites and ionises the gas molecules, creating a reactive mixture (species) of ions, electrons, radicals, and ultraviolet photons. The ionised species are then used to treat surfaces ready for bonding, coating, or further processing.
- Vacuum Plasma Cleaning: In low-pressure systems, gases such as oxygen, argon, nitrogen, or CF₄ are introduced into a sealed vacuum chamber. Once the right vacuum level is reached, radio frequency (RF) power is applied to electrodes in the chamber. This starts the formation of the plasma. The resulting plasma glow indicates active ionisation, and the reactive species begin interacting with surface contaminants.
- Atmospheric Plasma Cleaning: In atmospheric plasma systems, the process occurs in open air using compressed gases. High-voltage electrodes energise the gas stream directly, producing plasma without the need for vacuum. These systems are ideal for continuous inline cleaning and surface activation.
Wiki – Plasma Cleaning
View the Wikipedia “Plasma Cleaning” overview
Plasma Etch Inc. Website
Region
United Kingdom, Ireland & Scandinavia/Nordic Regions: Finland, Sweden, Norway & Denmark, Netherlands, France & Benelux
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