MA12 Operator Assisted Mask Aligner
MA12 Key Features
- Cost efficient 300 mm exposure tool
- High intensity exposure optics
- Contact Modes: Proximity, Soft, Hard, Vacuum
- Uniformity < 3.5% (300mm)
- LED or mercury lamp-house options
- Alignment Method: TSA, BSA, IR
- Diffraction Reducing Exposure Optics (HR & LGO)
- Small footprint and enhanced ergonomics
The MA12 Gen3 from SUSS is a high precision manual tool for processing 300mm wafers or up to 300x300mm substrates.
Based on the latest mask aligner technology from SUSS, the system provides a wealth of alignment capabilities with superior optical performance and high overlay accuracy required for 300mm wafers and substrates. The MA12 mask aligner has been designed with the production of MEMS devices on large substrates and advanced packaging applications in mind.
The MA12 is a high precision tool suited device development and production environments; the operator-assisted system maintains a high degree of process control and reliability in combination with the advantages of manual wafer handling.
Using the imprint technology SMILE from SUSS the MA12 Gen3 enables a large range of imprint and full field lithography applications for the LED, micro-optics, augmented reality, MEMS & NEMS as well as 3D integration and compound semiconductor markets.
MA12 Operator Assisted Mask Aligner Technical Downloads
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MA12 Mask Aligner Brochure
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Description
Description
What Is A Mask Aligner (IKB-068)
Link
Description
Photolithography Basics (IKB-038)
Link
Description
Imprint Photolithography (IKB-054)
Link
Description
Photolithography Exposure Modes (IKB-053)
Link
Description
Semiconductor Wafer Selection Guide (IKB-046)
Link
Description
Semiconductor Wafer Description Nomenclature (IKB-044)
Link
Description
What is Spin Coating? (IKB-075)
Link
Further Information
What is a Manual Mask Aligner?
A manual mask aligner is a photolithography tool used to align photomasks to wafers or substrates and transfer patterns using UV exposure. It provides high alignment accuracy with direct operator control, making it suitable for research, development and low volume semiconductor manufacturing.
Inseto Knowledge Base Document:
Read our guide to the “Wafer is a Mask Aligner?“
Wiki – Semiconductor Device Fabrication
Mask Aligner Applications
UV Lithography, Exposure and Printing of Semiconductor Wafers and other Substrates
Industry Segments
Semiconductor Wafer Fabrication, University Research and Development
SUSS Website
Region
United Kingdom, Ireland, Finland, Sweden, Estonia, Iceland & Norway
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