MJB4 Mask Aligner

The SUSS MJB4 Mask Aligner is a compact, high performance UV lithography system designed for research laboratories, universities, development environments, and pilot production facilities.

Supporting substrates from small die and sample pieces through to 100mm wafers, the MJB4 delivers exceptional alignment accuracy, exposure uniformity, and process repeatability in a reliable and easy to operate platform.

The system is designed for the processing of fragile, warped or part wafers and pieces from a few millimetres up to 100mm diameter. Precision alignment is achieved with a split field microscope, whilst a Wedge Error Compensation (WEC) provides optimal parallelism between the substrate and mask. 

The patented diffraction reducing optics feature fast switching between different wavelengths. An LED Lamp-house with light uniformity <2.5%, is switchable for Broadband or G, H & I lines as required.

Why Choose the SUSS MJB4?

The MJB4 has been engineered to provide laboratory and pilot production users with the performance expected from larger semiconductor lithography systems while maintaining a compact footprint and straightforward operation. Key advantages include:

• Processing of substrates from a few millimetres up to 100mm wafers
• Soft, hard, vacuum and soft-vacuum contact exposure modes
• High resolution lithographic patterning
• Precision mask-to-wafer alignment using a split-field microscope
• Wedge Error Compensation (WEC) for improved substrate and mask parallelism
• LED exposure system with broadband and G, H and I-line capability
• Excellent exposure uniformity of less than 2.5%
• Outstanding process repeatability and long-term reliability

These capabilities enable researchers and engineers to achieve consistent lithography results across a wide range of applications and substrate types.