HMxSquare Photo-mask Cleaner
HMxSquare Key Features
- Semiautomatic Photo Mask cleaning system
- Manual load with automatic sequential processing
- SEMI Certified and qualified for >1μm technology nodes
- High up-time and low Cost of Ownership
- Mask / substrate clean, develop, etch & strip
- For cleaning masks / pieces up to 9” or 50-200mm wafers
- Advanced safety features
- Small footprint and lost cost of ownership
The HMxSquare photo mask cleaner from SUSS is available in two models:
HMx9 – For cleaning up to 9” Masks, 50–200 mm diameter wafers, 3–9 inch square substrates and pieces
With a minimal cleanroom footprint, the systems are SEMI S2, S8, S13 compliant and designed for high-quality mask or substrate cleaning and the mask fabrication develop, clean and etch processes in the 3 µm – 250 nm technology nodes.
The HMxSquare is manually loaded with automatic sequential processing. With worldwide reference sites the systems combine stability and reliability to provide optimum results and a low cost of ownership.
The equipment is designed to comply with the latest environmental and safety regulations and is available with full-jet spray nozzle dispense with pre-heated media, front-side and back-side rinse, integrated acid-chemical storage, automatic chemical refill, brush, megasonic or binary spray and interchangeable chucks etc.
HMxSquare Photo-Mask Cleaner Downloads
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SUSS HMxSquare Photomask Equipment
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Knowledge Base Articles
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Photolithography Basics (IKB-038)
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Imprint Photolithography (IKB-054)
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What Is A Mask Aligner (IKB-068)
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Photolithography Exposure Modes (IKB-053)
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Semiconductor Wafer Selection Guide (IKB-046)
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What is Spin Coating? (IKB-075)
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Further Information
What is a Photomask Cleaning System?
A photomask cleaning system is a specialised tool used to remove particles, residues and contamination from photomasks and reticles used in semiconductor lithography. Photomasks carry the circuit patterns that are transferred onto wafers during exposure, so maintaining their cleanliness is essential to ensure accurate pattern transfer and high device yield.
During mask handling, storage and repeated use in lithography tools, photomasks can accumulate nanoscale particles, organic contamination or chemical residues. A photomask cleaning system uses controlled wet, dry or hybrid cleaning processes to remove these contaminants without damaging delicate mask features or pellicles.
Photomask cleaning systems are used in mask shops and wafer fabrication facilities to extend mask lifetime, reduce defectivity and support advanced lithography processes, including DUV and EUV technologies, where even very small contaminants can impact device performance.
Inseto Knowledge Base Document:
Read our guide to the “Wafer is a Mask Aligner?“
Wiki – Semiconductor Device Fabrication
Applications
Photomask cleaning, wafer and substrate cleaning, photoresist development, wet etching and resist stripping
Industry Segments
Semiconductor, MEMS Manufacturing, Photomask Production, Optoelectronics and Photonics and other semiconductor related applications
SUSS Website
Region
United Kingdom, Ireland, Finland, Sweden, Estonia, Iceland & Norway
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