Plasma Asher / Plasma Cleaner: PE-75

The PE-75 Plasma Asher / Plasma Cleaner is our largest entry level plasma treatment system, including all the features of the PE-50-XL, but with a larger circular aluminium vacuum chamber that is 250mm (10″) in diameter and 270mm (10.75″) deep with a direct powered RF electrode for processing up to 200mm (8″) parts.

When fitted with a high power RF source (13.56 MHz), the PE-75 is a popular choice for use as a plasma asher. Although all of our systems are versatile and can perform many tasks without changing configuration settings, the PE-75 is the best value in the industry for plasma ashing; the process of removing photoresist from an etched wafer. When fitted with a lower power RF source (200W 20-80KHz Auto Frequency Tuning with Adjustable Pulsing Rate), the system also excels at plasma cleaning and surface modification applications.

PE-75 features include:

• Durable Welded Round Aluminium Vacuum Chamber
• Chamber Dimensions: 250mm Diameter x 270mm Deep
• Single 225mm Wide x 250mm Deep Electrode
• 140mm Chamber Height Clearance
• 200W 20-80KHz Auto Frequency Tuning with Adjustable Pulsing Rate
• Optional high power 13.56MHz Supply
• 2 Rotometer Gas Control 0-25cc/min
• Thermocouple Vacuum Gauge, 0-1Torr
• PLC Microprocessor Control System
• Keypad user interface with alphanumeric display
• Storage of one Process Recipe
• Automatic Process Sequencing
• 5 CFM Oxygen Service Vacuum Pump
• Pump footprint 175x400mm (7” x 16”)
• Console Dimensions: 455x480x610mm (18x19x24″)
• Electrical: 230/240VAC, 14A
• Available in Venus configuration with PC Control
• Optional XL version: 395mm deep x 250mm diameter