Inseto

Turn Table Plasma Etching & Cleaning System: TT-1

TT-1 Key Features

  • Rotating active plasma processing for even treatment
  • 425mm diameter rotating turntable
  • Insulated or direct-on method of plasma treatment
  • 600W 13.56MHz Power Supply with Automatic Matching Network
  • PLC-based Touch Screen Control Interface

The TT-1 Turntable Plasma Etching and Cleaning System is a versatile solution designed for precision surface preparation in industrial environments.

Featuring a rotating platform for uniform plasma exposure, this system delivers exceptional cleaning and etching performance across complex geometries and multiple components. Ideal for applications requiring enhanced adhesion, contamination removal, and controlled surface modification, the TT-1 combines reliability with efficiency to meet the demanding standards of advanced manufacturing.

The Turn Table (TT) model is based on Plasma Etch Inc.’s BT-1 Platform, sharing the same robust and reliable features whilst providing enhanced surface modification capabilities, these include rotating active processing and a generously sized circular chamber, which has the option of insulated, or direct on electrode method of treatment.

Loading & processing proves is quick and effective, keeping production rates high, easily meeting demands of even the heaviest process requirements. The vacuum chamber contains two levels of electrodes, measuring up to 600mm / 24″ in diameter. The operator simply places product onto electrodes and the systems turntables rotate at a constant speed during the plasma cleaning cycle.

TT standard features include:

  • Single Level 430mm Dia. Rotating Electrode
  • Electrode Jog & Speed Control
  • R.F. Generator & Matching Network 600 Watts
  • Mass Flow Controller, 2 Channels 0-500 CC/Min
  • Vacuum Gauge 0-10 Torr
  • Microprocessor System Touch Screen Control
  • Multiple Sequence Storage
  • Vacuum Pump/Booster Blower, O2 Service
  • Dual Process Sequence
  • Oil Filtration, Vacuum Pump 3 Microns
  • Oil Mist Eliminator
  • Footprint, Plasma Console 790x760x1780mm
  • Footprint, Vacuum Pump 400x760x430mm

Optional System Features:

  • RF Generator 1250 Watts
  • Automatic N2 Purging, Vacuum Pump
  • Low Gas Alarms Up to 4 Channels
  • Computer Control System w/ Touch Screening
  • Data Reporting, Event Viewing, Printer
  • Signal Light Tower
  • Dry Vacuum Pump 79/355 CFM
  • Throttle Vacuum Controller
  • Mass Flow Controllers Up to 4 Channels
  • Controlled Rate N2 Chamber Purging
  • Oil Mist Eliminator
  • Custom Chambers and Electrodes

Please contact us for the full range of options.

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Further Information

Contact Us

Tel: +44 (0)1264 334505

Email: enquiries@inseto.co.uk

Applications

Contamination Removal, Hydrophilic Surface Modification, Surface Cleaning, Surface Preparation, Removal of Hydrocarbons, Organic Materials, Oxides and Sulphides, Industrial Production, Device Production, Solar Cell Fabrication, PCB Bare Board Manufacturing, Semiconductor Device Fabrication, Cleaning Devices prior to Wire Bond, etc.

Industry Segments

Semiconductor, Biomedical, Research, Development, University, Academic, Medical, Plastic, Glass, Automotive, Dental, Aerospace, PV, Military, Telecommunications, Electronics, Industrial, Photonics, Solar Cell, Nano Electronics, Fibre Optics, Microwave, Microelectronic, Printed Circuit Board etc.

Region

United Kingdom, Ireland & Scandinavia/Nordic Regions: Finland, Sweden, Norway & Denmark, Netherlands, France & Benelux

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