Inseto

uCHEM Wet Bench Etching Equipment

Wet Bench Etching Deck

  • Available for Cleaning, Etching, Dissolving etc.
  • Spin coater, Hot plates, Rinsing & Megasonic cleaning etc.
  • Manual through fully automated systems, including doising and drain
  • Batch or Single Wafer Versions; customized solutions are possible
  • PLC controlled with Touch Panel for easy operation
  • Housing is made of polypropylene or stainless steel for solvents
  • Heatable Quartz Tank for clean wafer processing
  • Standard Overflow Rinse, optional: QDR, SRD

The etching unit μChem is a wet bench etching process tool suitable for all standard wet etch chemical process steps used in the semiconductor, optical, solar-cell and MEMS industries.

The ideal wet etch tool for either industrial or R&D demands due to the flexible arrangement and build-up of the processes modules. The complete system is built from plastics (PP white) or stainless steel to guarantee the maximal resistance against chemical attacks of either acids, bases or solvent processes. The plumbing can be made from PP, PVDF, PFA or SS tubing and the door materials are from a transparent PVC.

The MOT team additionally offers customised solutions tailored to the specific technical details of your wet etch chemical process. The applications lab in Germany has all necessary tools to process wafers, measure results and optimise the configuration to help select chemistries and advise you on the options available each step of the way.

Suitable for wafer sizes up to 300 mm the μChem etching system is used for a variety of applications from MEMS and CMOS production to sensor and photovoltaic device fabrication. A variety of options are available from automatic robot handling; overflow circulation with filtration; ultra or mega sonic nozzle dispense units; internal chemical management and the integration of pre/post process cells and laminar flow units. Additional components such as third party spin coater, hotplates and megasonic cleaning systems can be integrated.

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Knowledge Base Articles

Further Information

Contact Us

Tel: +44 (0)1264 334505

Email: enquiries@inseto.co.uk

What is Wet Bench Etching Equipment?

Wet bench etching equipment is a specialised wet process system used in semiconductor wafer fabrication to chemically remove material from wafer surfaces in a controlled and repeatable manner. The equipment enables precise management of process parameters such as chemical concentration, temperature and flow to ensure uniform etch results across the wafer.

In semiconductor manufacturing, wet bench etching tools are used for cleaning, surface preparation and etching steps across a wide range of materials. Typical applications include oxide and metal etching, resist removal and wafer conditioning for MEMS, CMOS and compound semiconductor processes. These systems often integrate rinsing and drying modules to support complete wet process sequences within a cleanroom compatible platform.

Inseto Knowledge Base Document:

Read our guide to the “Semiconductor Photolithography Basics

Wiki – Semiconductor Device Fabrication

Semiconductor Device Fabrication overview – Wikipedia

Wet Bench Etching Applications

Cleaning, Etching and Dissolving Semiconductor Wafers and Substrates for MicroFluidic Devices, Power Semiconductors, MEMS Devices, Compound & GaN Materials, Photonic, Photovoltaic and LED Components etc.

Industry Segments

Semiconductor Wafer Fabrication, University Research and Development, Microtechnology and electronics, Optical and Photonics industries.

Region

United Kingdom, Ireland, Finland, Sweden, Denmark, Estonia, Iceland & Norway

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