uSRD Wafer Spin Rinse Dryer

The MOT μSRD is an advanced Spin Rinse Dryer system developed by M-O-T GmbH. The μSRD is designed for cleaning and drying wafers following all wet chemical batch applications. The standalone MOT μSRD is specially designed for easy operation and maintenance and the unit can be seamlessly integrated into the other MOT wet bench solutions such as μChem, μGalv, μPorsi and μChem-ECES

A single cassette of wafers is placed in an easily exchanged stainless steel rotor. To ensure resistance from a wide range of chemicals (both acids and bases) the chamber of the system is made of plastic (PP white) with a PVC door. The wafer basket can hold both high profile and low profile wafer cassettes up to 25 wafers. As with all MOT solutions, the system is compatible with wafers up to 300 mm in diameter.

The μSRD has the capability to store 10 pre configured recipes, these can be written, updated and modified by the user using the intuitive μSRD and operating software and touch panel interface. The recipes can be selected individually or clustered to create a more complex spin, rinse dry protocol.